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A theoretical model for neutral velocity distributions at a planar target in plasma source ion implantation

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1 Author(s)
Dezhen Wang ; Department of Physics, National Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, People’s Republic of China

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.370295 

A theoretical model is developed to study the velocity distributions of neutrals striking a planar target in plasma source ion implantation (PSII) for the case in which the pressure of the gas is large enough that the fast neutrals can be produced in the sheath by ion-neutral charge exchange collisions. An analytic expression for the neutral velocity distribution at the target is provided. The theoretic results agree with Monte Carlo simulations. © 1999 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:85 ,  Issue: 8 )

Date of Publication:

Apr 1999

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