Cart (Loading....) | Create Account
Close category search window

Artificial dielectrics: Nonlinear properties of Si nanoclusters formed by ion implantation in SiO2 glassy matrix

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Vijayalakshmi, S. ; Optical Waveguide Laboratory, Department of Electrical and Computer Engineering, New Jersey Institute of Technology, Newark, New Jersey 07102 ; Grebel, H. ; Iqbal, Z. ; White, C.W.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The nonlinear optical properties of Si nanoclusters formed by ion implantation into an SiO2 glassy matrix and followed by annealing have been studied at λ=532 nm and λ=355 nm by use of Z-scan and pump-probe techniques. These have been compared to the nonlinear properties of laser-ablated Si films. At relatively large intensities (≫1 MW/cm2), the absolute nonlinear values for these isolated nanoclusters were comparable to those obtained for laser-ablated samples although opposite in sign. Laser-ablated samples showed a much larger effect at relatively low intensities (≪1 MW/cm2), while the ion-implanted films showed almost none. Lifetime constants were in the range of 3–5 ns for all samples. © 1998 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:84 ,  Issue: 12 )

Date of Publication:

Dec 1998

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.