Close category search window
 

Temperature and injection dependence of the Shockley–Read–Hall lifetime in electron-irradiated p-type silicon

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Keskitalo, N. ; Department of Technology/Solid State Electronics, Uppsala University, P.O. Box 534, SE-751 21 Uppsala, Sweden ; Jonsson, Per ; Nordgren, K. ; Bleichner, H.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.367176 

The Shockley–Read–Hall (SRH) carrier lifetime in electron-irradiated low-doped p-type silicon was measured at different injection levels and various temperatures. The lifetime under high-level injection was determined using the open-circuit carrier decay technique. The reverse recovery technique was used to determine the lifetime under low-level injection. The defect composition was studied using deep-level transient spectroscopy, and according to that the SRH lifetime is calculated. The good agreement between the calculated and the measured lifetimes strongly indicates that the lifetime is controlled by two different deep levels. At low injection levels, the lifetime is mainly controlled by the singly negative charge state of the divacancy center, HC-HT=0.421 eV, and at high injection levels by the vacancy–oxygen complex, HC-HT=0.164 eV. These are the same levels controlling the lifetime in electron-irradiated n-type silicon. © 1998 American Institute of Physics.

Published in:
Journal of Applied Physics  (Volume:83 ,  Issue: 8 )

Date of Publication: Apr 1998

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.