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Melting and vaporization for large-area film removal with a chemical oxygen–iodine laser

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2 Author(s)
Xie, J. ; Center for Research and Education in Optics and Lasers (CREOL), and Mechanical, Materials and Aerospace Engineering Department, University of Central Florida, 4000 Central Florida Boulevard, Orlando, Florida 32816-2700 ; Kar, A.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.366330 

Large-area film removal with lasers is a physical process of melting and vaporization of films. A mathematical model is developed to simulate the melting and vaporization of films under the irradiation of a chemical oxygen–iodine laser. The cross section of the film after laser scanning and the substrate surface temperature during laser irradiation are presented. There is an optimum laser power at which relatively wide films can be removed by maintaining low temperature at the substrate surface. The optimum laser power is associated with other process parameters. The results of film removal with TEM31 and TEM00 beams are compared, and the laser mode with more uniform intensity distribution is found to be more effective for large-area film removal. © 1997 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:82 ,  Issue: 10 )

Date of Publication:

Nov 1997

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