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Dominant diffusing species during cobalt silicide formation

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2 Author(s)
Comrie, C.M. ; University of Cape Town, Rondebosch 7700, South Africa ; Newman, R.T.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.360923 

The dominant moving species during cobalt monosilicide and cobalt disilicide formation has been examined using a thin tantalum layer as a metal marker. The marker data obtained following the formation of CoSi from Co2Si showed that monosilicide growth was essentially due Si diffusion only. When used to study CoSi2 formation, the data indicated that silicon was also the dominant moving species during disilicide formation, although a noninsignificant amount of cobalt diffusion was also observed to take place. © 1996 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:79 ,  Issue: 1 )

Date of Publication:

Jan 1996

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