Cart (Loading....) | Create Account
Close category search window

Dominant diffusing species during cobalt silicide formation

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Comrie, C.M. ; University of Cape Town, Rondebosch 7700, South Africa ; Newman, R.T.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

The dominant moving species during cobalt monosilicide and cobalt disilicide formation has been examined using a thin tantalum layer as a metal marker. The marker data obtained following the formation of CoSi from Co2Si showed that monosilicide growth was essentially due Si diffusion only. When used to study CoSi2 formation, the data indicated that silicon was also the dominant moving species during disilicide formation, although a noninsignificant amount of cobalt diffusion was also observed to take place. © 1996 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:79 ,  Issue: 1 )

Date of Publication:

Jan 1996

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.