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The technique of ion‐induced quantum‐well (QW) intermixing using broad area, high energy (2–8 MeV As4+) ion implantation has been studied in a graded‐index separate confinement heterostructure InGaAs/GaAs QW laser. This approach offers the prospect of a powerful and relatively simple fabrication technique for integrating optoelectronic devices. Parameters controlling the ion‐induced QW intermixing, such as ion doses, fluxes, and energies, post‐implantation annealing time, and temperature are investigated and optimized using optical characterization techniques such as photoluminescence, photoluminescence excitation, and absorption spectroscopy. © 1995 American Institute of Physics.