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Properties of a vacuum ultraviolet laser created plasma sheet for a microwave reflector

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5 Author(s)
Shen, W. ; Department of Electrical and Computer Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706 ; Scharer, J.E. ; Lam, N.T. ; Porter, B.G.
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A 193 nm excimer laser and a custom fabricated cylindrical lens system is used to produce a plasma sheet of 8 cm×30 cm×0.4 cm in tetrakis(dimethylamino)ethylene (TMAE), a low ionization energy organic gas. Plasma density variation due to photon absorption is studied by scanning the filling pressure of TMAE between 12 and 150 mTorr. A high density (n≥2.0×1013 cm-3), low temperature (Te≊0.8 eV) plasma sheet of 4 mm thickness is obtained with less than 50% spatial density variation over the 30 cm axial length. Charge recombination is found to be the dominant process for t≤1.2 μs with the plasma diffusion playing a perturbational role. A one‐dimensional plasma model is utilized to model the experimental plasma data by treating the diffusion as a perturbation. This study shows that the recombination coefficient is 1.8±0.1×10-7 cm3 s-1 and the diffusion coefficient is 2.8±0.4×104 cm2 s-1. The plasma sheet has attractive properties for a microwave agile mirror. © 1995 American Institute of Physics.

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Journal of Applied Physics  (Volume:78 ,  Issue: 12 )