By Topic

Characteristics of electron cyclotron resonance plasma generated in a rectangular waveguide by high-power microwave

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Mishra, Lekha Nath ; Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University, 7-1-2 Yoto, Utsunomiya, Tochigi 321-8585, Japan ; Shibata, Kanetoshi ; Ito, I. ; Yugami, Noboru
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1630858 

A new source for the generation of overdense plasma is developed using an electron cyclotron resonance (ECR) technique in a rectangular waveguide by a high-power (1 kW) microwave of frequency 2.45 GHz. The characteristics of the plasma for Ar gas are presented, including a large surface area to fill the entire waveguide of length 100 cm with uniformity ±3% over 50 cm. With the help of a Langmuir probe, plasma density about 1012cm-3 and electron temperature of 8–12 eV are observed, and their dependence on the background gas pressure and magnetic field are also examined. It is shown that these parameters can be controlled by adjusting the gas pressure, magnetic fields, and/or microwave power. Such a plasma could be useful in plasma processing and in background plasma for the concept of plasma-based particle accelerators as well. © 2004 American Institute of Physics.

Published in:

Review of Scientific Instruments  (Volume:75 ,  Issue: 1 )