DoseSim: Microsoft-Windows graphical user interface for using synchrotron x-ray exposure and subsequent development in the LIGA process

The LIGA process, which combines x-ray lithography with electroplating and moulding, is a technique used worldwide for the fabrication of high aspect ratio microstructures. In the first step (x-ray lithography), a resist layer is applied to a metal-coated substrate, which is then patterned by shadow printing through an x-ray mask with synchrotron radiation. The second step consists in dissolving the exposed parts or the unexposed parts, of a positive and negative resist, respectively, in an organic developer. A graphical user interface has been developed, working under Windows, which meets the necessary requirements of a LIGA x-ray beamline. The code currently permits the computation of synchrotron radiation from bending magnets, the effects of the optical properties of materials, and the necessary parameters for the resist exposure. Also, this program is highly flexible and allows the user to access many annexed calculation possibilities, for example, optimization of the absorber thickness for a desired dose after the absorber, filter possibilities for a desired ratio top dose/bottom dose, calculation of the necessary time to develop the exposed resist. The comparison of results of this code and data used by different x-ray LIGA centers will be given. A general overview of the possibilities of this program will be presented. © 2003 American Institute of Physics.