By Topic

Production of highly charged ions in electron cyclotron resonance ion sources using an electrode in two modes

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Biri, S. ; Institute of Nuclear Research (ATOMKI), Bem tér 18/c, Hungary ; Kenez, L. ; Valek, A. ; Nakagawa, T.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1150316 

One of the most known ways to obtain higher beam intensities in electron cyclotron resonance (ECR) ion sources is to install an electrode (usually disk) into the plasma chamber. We found that a majority of the groups observed the beam intensity improvement by supplying a suitable biased voltage to the electrode and an electron current was injected into the plasma. A few groups observed the enhancement, however, when the electrode operated at floating potential—without being an electron donor. In spite of the great success of the “biased disk” method, the mechanism is still not completely clear. In this contribution, as a step toward of understanding, we examined the above mentioned two modes. The experiments were performed at the 18 GHz RIKEN and at the 14.5 GHz ATOMKI ECR ion sources. © 2000 American Institute of Physics.

Published in:

Review of Scientific Instruments  (Volume:71 ,  Issue: 2 )