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Ultrahigh vacuum surface analysis coupled with a high pressure system for the study of near critical and supercritical fluid processing

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2 Author(s)
Bakker, G.L. ; Department of Chemical Engineering, Lehigh University, Bethlehem, Pennsylvania 18015 ; Hess, D.W.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1147806 

A system has been constructed for ultrahigh vacuum analysis investigation of surfaces after high pressure fluid processing. The system features a cell capable of withstanding pressures up to 400 bar that opens directly into an ultrahigh vacuum (10-10 Torr) system to allow transfer of samples for analysis. Temperature control of the cell and fluid is possible to within ±1 °C up to temperatures of 400 °C. The high pressure system design allows the preparation and study of supercritical fluid mixtures as well as of pure components. X-ray photoelectron spectroscopy, Auger electron spectroscopy, sputter etching, and vacuum anneal capabilities comprise the surface analysis system. The fluids investigated include supercritical carbon dioxide, methanol, water, and their mixtures; these are applied to processes such as surface cleaning and thin film etching using high pressure fluids. © 1997 American Institute of Physics.

Published in:

Review of Scientific Instruments  (Volume:68 ,  Issue: 1 )

Date of Publication:

Jan 1997

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