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A plasma source was developed for ion implanters capable of irradiating large‐area substrates. Microwave discharge is performed by electron cyclotron resonance (ECR). A rectilinearly wide flux of magnetic induction is formed with two long permanent magnets with oppositely facing poles. The ECR zone formed inside a vacuum chamber is elongated in the direction along the pole faces. A waveguide slotted along its E plane is inserted between the magnets. The long slot radiates microwaves into the vacuum chamber through dielectric materials. These materials play the role of waveguide. Plasmas are uniformly generated in the direction along the slotted waveguide when it is terminated with a short plunger. This mechanism is analyzed by calculating radiation patterns of the slotted waveguide. © 1996 American Institute of Physics.