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Electron beam induced deposition of iron nanostructures

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3 Author(s)
Hochleitner, G. ; Institute for Solid State Electronics, Vienna University of Technology, Floragasse 7/1, A-1040 Vienna, Austria ; Wanzenboeck, H.D. ; Bertagnolli, E.

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Electron beam induced deposition is among the most prospective methods for size- and position-controllable nanofabrication of three-dimensional structures. Direct-write maskless nanostructure fabrication was performed with a scanning electron microscope. Three-dimensional iron structures were obtained by locally confined electron induced dissociation of an iron carbonyl (Fe(CO)5) precursor. Vertical nanopillars consisting of Fe with O and C contaminations were deposited. Two different growth regimes—electron induced growth and autonomous growth—were observed. The precursor pressure was shown to have a significant influence on the growth mode.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:26 ,  Issue: 3 )