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Novel photocurable epoxy siloxane polymers for photolithography and imprint lithography applications

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7 Author(s)
Wang, Pei-I ; Center of Integrated Electronics, Rensselaer Polytechnic Institute, CII 6015, 110 8th Street, Troy, New York 12180-3590 ; Nalamasu, O. ; Ghoshal, Rajat ; Ghoshal, Ram
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2834559 

Polyset epoxy siloxane (PES) polymer is ultraviolet (UV) curable with photoinitiator chemistry based on cationic polymerization. In the present work the authors have investigated the photodefinition characteristics of the epoxy siloxane polymers using photolithography and imprint lithography. The scanning electron microscopic images of the UV-cured patterns exhibit appealing resolution of micrometer scale features for photolithography processes. The imprint lithography has been examined with features smaller than 200 nm. In conjunction with the promising dielectric properties, epoxy siloxane polymers are particularly useful for applications such as the redistribution layer in packaging of integrated circuits.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:26 ,  Issue: 1 )

Date of Publication:

Jan 2008

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