By Topic

Surface structure characterization of nanodiamond thin film for electronic field emission applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Xie, F.Y. ; Instrumental Analysis & Research Center, Sun Yat-sen (Zhongshan) University, Guangzhou 510275, People’s Republic of China ; Xie, W.G. ; Chen, J. ; Liu, X.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2825144 

The nanodiamond thin film is deposited on a single crystal silicon substrate by a dip-coating technique from the pretreated nanodiamond suspension. The surface structures of the as-prepared thin film and the annealed sample have been investigated by x-ray photoelectron spectroscopy and nuclear magnetic resonance. The change of surface elements of O, N, and a different hybridized carbon is derived. Initiation of graphitization is observed at an annealing temperature of 900 °C and the dangling bonds from the internal diamond phase are confirmed. The electron field emission property of this annealed sample is better than the as-prepared thin film. The enhancement of electron emission is discussed with the change of surface structure and the surface states.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:26 ,  Issue: 1 )