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58 nm half-pitch plastic wire-grid polarizer by nanoimprint lithography

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7 Author(s)
Chen, Lei ; NanoOpto Corporation, 1600 Cottontail Lane, Somerset, New Jersey 08873 ; Wang, Jian Jim ; Walters, Frank ; Deng, Xuegong
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2801967 

Plastic nanowire-grid polarizers based on small period, 58 and 75 nm half-pitch, Al gratings are fabricated and studied. Al gratings are made by coating Al on the polymer grating sidewalls at oblique angles. The nanopolymer gratings on plastic film over large area are made by nanoimprint lithography. By optimizing the grating period, grating linewidth, Al coating depth, and thickness, excellent maximum transmittance (Tmax) (80%–90%) and extinction ratio (∼30 dB) are achieved.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 6 )

Date of Publication:

Nov 2007

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