By Topic

V-groove plasmonic waveguides fabricated by nanoimprint lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
6 Author(s)
Fernandez-Cuesta, I. ; CNM-IMB—Centro Nacional de Microelectrónica—Institut de Microelectrónica de Barcelona (CSIC), Campus de la Universitat Autònoma de Barcelona, 08193-Bellaterra, Spain ; Nielsen, Rasmus Bundgaard ; Boltasseva, Alexandra ; Borrise, Xavier
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2779041 

Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 6 )