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Annealing of electron beam induced deposits of platinum from Pt(PF3)4

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6 Author(s)
Ervin, M.H. ; U.S. Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783 ; Chang, Daniel ; Nichols, B. ; Wickenden, Alma
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Electron beam induced deposition (EBID) is of interest as a damage-free and resist-less means of incorporating nonconventional materials such as polymer fibers, nanowires, and carbon nanotubes into integrated circuits. A novel inorganic platinum precursor—Pt(PF3)4—is investigated in this work, as it has previously been demonstrated to deposit Pt with resistivities close to bulk Pt when deposited using high dose rates. In this work, the effects of 100 and 200 °C anneals on these Pt deposits are examined. Annealing these deposits is observed to shrink the deposits and decrease their P content. As a result, the measured Pt resistivities decreased with annealing by factors of 1.6–9.9.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 6 )

Date of Publication:

Nov 2007

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