IEEE.org| IEEE Xplore Digital Library| IEEE Standards| IEEE Spectrum| More Sites

Cart (Loading....) | Create Account | 

Close category search window
Author Searchbeta |  Advanced Search  |  Preferences |  Search Tips  |  More Search Options  
 
Browse Journals & Magazines > Journal of Vacuum Science & T ...> Volume:25 Issue:6 Help

Annealing of electron beam induced deposits of platinum from Pt(PF3)4

Full Text Sign-In or Purchase

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing! close button
puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Ervin, M.H. ; U.S. Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783 ; Chang, Daniel ; Nichols, B. ; Wickenden, Alma
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2806978 

Electron beam induced deposition (EBID) is of interest as a damage-free and resist-less means of incorporating nonconventional materials such as polymer fibers, nanowires, and carbon nanotubes into integrated circuits. A novel inorganic platinum precursor—Pt(PF3)4—is investigated in this work, as it has previously been demonstrated to deposit Pt with resistivities close to bulk Pt when deposited using high dose rates. In this work, the effects of 100 and 200 °C anneals on these Pt deposits are examined. Annealing these deposits is observed to shrink the deposits and decrease their P content. As a result, the measured Pt resistivities decreased with annealing by factors of 1.6–9.9.

Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 6 )

Date of Publication: Nov 2007

Page(s):
2250 - 2254
ISSN :
1071-1023
Digital Object Identifier :
10.1116/1.2806978
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Nov 2007

IEEE Account

Purchase Details

Profile Information

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.