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Browse Journals & Magazines > Journal of Vacuum Science & T ...> Volume:25 Issue:6 Help

Bit-array patterns with density over 1 Tbit/in.2 fabricated by extreme ultraviolet interference lithography

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2 Author(s)
Solak, Harun H. ; Laboratory for Micro and Nanotechnology, Paul Scherrer Institute, 5232 Villigen PSI, Switzerland and EULITHA GmbH, c/o Paul Scherrer Institute, Switzerland ; Ekinci, Yasin
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.2799974 

The use of patterned magnetic media in future data storage devices requires the fabrication of two-dimensional periodic patterns with resolution well below 35 nm in terms of the pattern period. The authors have used extreme ultraviolet interference lithography based on transmission diffraction gratings to demonstrate arrays of structures in negative resists calixarene and hydrogen silsesquioxane. The produced patterns have density exceeding 1 Tbit/in.2. Analysis of structure size and position on one of the patterns indicates variations of subnanometer magnitude.

Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 6 )

Date of Publication: Nov 2007

Page(s):
2123 - 2126
ISSN :
1071-1023
Digital Object Identifier :
10.1116/1.2799974
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
Nov 2007
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