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Thermal model of miniaturized Schottky emitter for parallel electron beam lithography

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4 Author(s)
Dokania, A.K. ; Charged Particle Optics, Delft University of Technology, Lorentzweg 1, 2628 CJ Delft, The Netherlands ; Velthuis, J.F.M. ; Zhang, Yanxia ; Kruit, P.

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For parallel electron beam lithography, an array of miniaturized Schottky emitters is proposed. The design of this miniaturized Schottky emitter unit is analyzed thermally to determine optimum power and filament dimensions. A numerical thermal analysis in steady state condition has been done and the temperature of the tip has been determined for different currents and heating filament dimensions. The model has been verified with some available experimental data. The optimized solution from the model will be used for fabrication of an array of miniaturized Schottky emitters.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:25 ,  Issue: 2 )