Fabrication of thin film silicon bridge microresonators on glass substrates using an unzipping sacrificial polymer has been demonstrated. Polynorbornene, which can be thermally decomposed at ∼425 °C, has been used as the sacrificial layer, allowing a simple, fully dry sacrificial layer removal. The polynorbornene is spin coated onto the substrate and patterned by photolithography. A thin film silicon structural layer is deposited by rf plasma-enhanced chemical vapor deposition and patterned to form a microbridge. The microbridges are electrostatically actuated and the resulting deflection is measured optically. The fabricated microbridges show resonance frequencies of the order of ∼4.4 MHz and quality factors ∼450.