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Highly porous silicon membrane fabrication using polymer self-assembly

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8 Author(s)
Black, C.T. ; IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598 ; Guarini, K.W. ; Breyta, G. ; Colburn, M.C.
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A combination of diblock copolymer self-assembly and state-of-the-art semiconductor device fabrication methods is used to create highly uniform suspended porous silicon membranes. Integration of these two processing techniques is key to realizing manufacturable high quality devices. Three different methods are shown for adjusting membrane pore dimensions between 10 and 35 nm, allowing device optimization for specific applications.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:24 ,  Issue: 6 )