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Fabrication of 1/4 wave plate by nanocasting lithography

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6 Author(s)
Yoshikawa, Takashi ; Graduate School of Engineering, Osaka Prefecture University, 1-1, Gakuen-cho, Sakai, 599-8531 Osaka, Japan ; Konishi, Takaaki ; Nakajima, Masaki ; Kikuta, H.
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Nanocasting lithography is one of the convenient ways to fabricate micronanostructures using various kinds of polymers without special tools. Nanocasting lithography is demonstrated for a 50 nm half-pitch pattern, high-aspect-ratio micropillars, and high-aspect-ratio nanogratings for wave plates. The defect, which is caused by an air bubble in the sub-100 nm pattern, is successfully eliminated by vacuum baking after spin coating of a polymer. Also, a high-aspect-ratio structure having 400 nm pitch and 1.9 μm height was successfully fabricated by polycarbonate for 2000×200 μm. These structures show a 1/5 wave shift for the 633 nm wavelength.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:23 ,  Issue: 6 )