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Controllable two-dimensional photonic crystal patterns fabricated by nanosphere lithography

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4 Author(s)
Han, Shuo ; State Key Laboratory on Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University, Beijing 100084, People’s Republic of China ; Hao, Zhibiao ; Jian Wang ; Luo, Yi

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Two-dimensional (2D) photonic crystal patterns have been fabricated by an improved nanosphere lithography method. By introducing an intermediary SiO2 layer between the self-assembled layer and the substrate, this method can be applied to a wide range of materials without much concern for their surface hydrophilicity. The controllability of the photonic crystal patterns has also been investigated. The air-filling factor of the photonic crystal patterns can be easily tailored by thinning the polymer nanospheres in inductively coupled O2 plasma with a controllable etch rate. Large-area ordered 512 nm pitch hole array, with vertical and smooth sidewalls, has been successfully formed on a GaAs substrate, indicating the potential application in photonic crystal devices of this method.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:23 ,  Issue: 4 )