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Lithographic patterning of a highly metallized polymer resist system and pyrolytic or plasma treatment to afford ferromagnetic ceramics

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2 Author(s)
Clendenning, Scott B. ; Department of Chemistry, University of Toronto, Toronto, Ontario M5S 3H6, Canada ; Manners, I.

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The highly metallized polymer cobalt-clusterized polyferrocenylsilane (Co-PFS) has been shown to act as a negative-tone resist for electron-beam lithography and UV-photolithography. Ferromagnetic ceramics containing Fe/Co alloy nanoparticles result from subsequent pyrolysis or reactive ion etching in a secondary magnetic field.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:22 ,  Issue: 6 )

Date of Publication:

Nov 2004

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