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Scanning-spatial-phase alignment for zone-plate-array lithography

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5 Author(s)
Menon, Rajesh ; Department of Electrical Engineering and Computer Science, and Research Laboratory of Electronics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 ; Moon, Euclid E. ; Mondol, Mark K. ; Castano, Fernando J.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1809631 

In this article, we describe a technique for level-to-level alignment in zone-plate-array lithography that does not require an external microscope, yet provides overlay superior to conventional microscopes.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:22 ,  Issue: 6 )