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Conductive nanostructure fabrication by focused ion beam direct-writing of silver nanoparticles

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4 Author(s)
Kong, David S. ; Massachusetts Institute of Technology, Center for Bits and Atoms, Media Laboratory, 20 Ames Street, Cambridge, Massachusetts 02139 ; Varsanik, Jonathan S. ; Griffith, Saul ; Jacobson, Joseph M.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1825015 

A focused ion beam has been used to directly pattern thin films of organometallic silver nanoparticles down to a resolution of 100 nm. The unexposed regions were washed in hexane leaving the desired pattern, and subsequent annealing formed conductive, metallic features. Multiple-layer structures were also fabricated by spin-coating and exposing additional films of silver nanoparticles on top of already patterned structures. The sensitivity of the nanoparticles to 30 keV Ga+ ions was measured to be approximately 5 μC/cm2. Using this technique test structures were fabricated in two and three dimensions with resistivities as low as 288 μΩ cm and 13 μΩ cm for single- and multiple-layer structures, respectively, as compared to a value of 1.589 μΩ cm for bulk silver. To our knowledge, this is the highest demonstrated throughput for any electron or ion beam direct-write process utilizing metal-organic precursors.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:22 ,  Issue: 6 )

Date of Publication:

Nov 2004

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