We have investigated the formation of multilayer structures of SiC/Si-dots on Si(100) by supersonic free jet chemical vapor deposition. CH3SiH3 and Si3H8 jets were used for SiC and Si-dots, respectively. The first epitaxial SiC layer with a thickness of ∼15 nm and polycrystalline Si-dots with a size of ∼100 nm were grown by the first CH3SiH3 and following Si3H8 jet exposures. When the CH3SiH3 and Si3H8 jets were directed onto the Si-dot surface, thin (∼5 nm) SiC layers and ∼50 nm Si-dots were grown and formed Si-dots/SiC/Si-dots/SiC/Si(100). By repeating these SiC and Si-dots growths, polycrystalline SiC/Si-dots multilayer was formed on Si(100). © 2003 American Vacuum Society.