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Graphitization of amorphous carbon pillar grown by focused-ion-beam-induced chemical-vapor deposition was demonstrated using an iron catalyst. The graphitization was induced by iron particles at the top of the pillar that were locally doped. Such graphitization of amorphous carbon seems to be based on solid phase crystallization, where homo-epitaxial growth on a graphite template appeared to have occurred. The original three-dimensional shape of an as-grown structure survived solid phase graphitization at 820 °C. © 2002 American Vacuum Society.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures (Volume:20 , Issue: 6 )
Date of Publication: Nov 2002