Referenced Items are not available for this document.
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1445168
Conventional electron-beam lithography has been used to fabricate mesoscopic Nb wires. Nb was deposited in an ultrahigh vacuum evaporation chamber using electron gun heating. The typical linewidth and the thickness were 200 and 50 nm, respectively. The transition temperatures were above 7 K. They increased with thickness and linewidth. To demonstrate the feasibility of two angle evaporation techniques, we also fabricated
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:20
,
Issue:
1
)
Date of Publication: Jan 2002
- Page(s):
- 386 - 388
- ISSN :
- 1071-1023
- Digital Object Identifier :
- 10.1116/1.1445168
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- Jan 2002
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
