By Topic

Induced crystallization as a nonlithographic pattern transfer technique for nanofabrication

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Cabral, M.J. ; Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904 ; Lye, W.K. ; Bean, J.C. ; Reed, M.L.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Controlled crystallization of amorphous films through “nanoprinting” is a novel pattern transfer technique that has been demonstrated for submicron features. Amorphous Ge and indium tin oxide (ITO) films are investigated for their suitability as a pattern transfer layer by direct contact with a patterned printhead. The printhead is heated and brought into contact with the amorphous film, transforming the contacted areas from amorphous to crystalline material. After crystallization, the amorphous regions are selectively etched away, leaving the desired pattern in crystalline material. Theoretical modeling suggests that this technique can be used for pattern transfer of features less than 50 nm. © 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:19 ,  Issue: 6 )