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Browse Journals & Magazines > Journal of Vacuum Science & T ...> Volume:19 Issue:3 Help

Electron emission from nanocrystalline diamond films

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4 Author(s)
Changzhi Gu ; State Key Laboratory for Superhard Materials, Jilin University, Changchun 130023, China ; Jiang, Xin ; Jin, Zengsun ; Weibiao Wang

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1372919 

The electron emission properties of nanocrystalline diamond films were described. The nanometer structured diamond films were deposited by the microwave plasma assistance chemical vapor deposition method via continuous H+ ion bombardment. The grain size of nanocrystalline diamond films can be modified by means of changing the energy of bombarded ions. Scanning electron microscopy and Raman spectroscopy indicated the nanometer structure of the films. The results suggested that low-field electron emission and high emission current can be obtained from the films consisting of nanosized diamond grains. © 2001 American Vacuum Society.

Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:19 ,  Issue: 3 )

Date of Publication: May 2001

Page(s):
962 - 964
ISSN :
1071-1023
Digital Object Identifier :
10.1116/1.1372919
Product Type:
Journals & Magazines
Date of Current Version :
18 June 2009
Issue Date :
May 2001

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