By Topic

Field electron emission from patterned nanostructured carbon films on sodalime glass substrates

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
5 Author(s)
Park, Kyung Ho ; Department of Molecular Science and Technology, Ajou University, Suwon 442-749, Korea ; Lee, Kyung Moon ; Choi, Seungho ; Lee, Soonil
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link: 

Using the hot filament chemical vapor deposition method, patterned nanostructured carbon films with excellent field emission characteristics have been deposited at the nominal substrate temperatures of 540 °C and 450°C on sodalime glass substrates. These films have demonstrated a good visual emission uniformity and good current stability during the continuous operation for 140 h. Taking advantage of the poor adhesion of the nanostructure carbon without a chrome interlayer and selective growth on the metal catalyst, the formation of the patterned nanostructured carbon films has been carried out via the prepattering of the chrome electrodes and/or metal catalyst using the conventional photolithography process. An example of the patterned emitter with high complexity is presented to demonstrate the feasibility of practical emitter fabrication using nanostructured carbon films. © 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:19 ,  Issue: 3 )