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Erratum: Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse [J. Vac. Sci. Technol. B 18, 3313 (2000)]

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6 Author(s)
Goldfarb, Darı o L. ; Department of Chemical Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706 ; de Pablo, Juan J. ; Nealey, Paul F. ; Simons, John P.
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© 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:19 ,  Issue: 2 )