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Growth, microstructure, and microhardness of W/Mo nanostructured multilayers

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5 Author(s)
Geyang, Li ; State Key Laboratory of MMCS, Shanghai Jiaotong University, Shanghai, 200030 China ; Junhua, Xu ; Liuqiang, Zhang ; Liang, Wu
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.1335677 

Artificially modulated W/Mo multilayers on polished stainless-steel substrates with modulation wavelength Λ ranging from 4.0 to 60.0 nm and total film thickness of 2.0 μm were prepared by magnetron sputtering. X-ray diffraction (XRD) and cross-sectional transmission electron microscopy showed that though the polycrystalline films exhibited coherent interfaces, the interfaces have a wave-like appearance due to the different orientations of individual crystals. The interplanar spacings of the W and Mo layers determined by the XRD method in W/Mo multilayers varied with the modulation wavelength. The mechanical properties of these films were investigated by a low-load microhardness indentation technique. The maximum hardness enhancement is about 51% higher than the value calculated from the role of mixtures at wavelength Λ=10.0 nm. The Koehler’s modulus difference model and Cahn’s coherent stress model have been used to estimate the hardness enhancement of W/Mo multilayers. From the comparison of theoretical calculation results with experimental dates, it is obvious that the combination of the two models can explain the hardness enhancement in W/Mo multilayers. © 2001 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:19 ,  Issue: 1 )

Date of Publication:

Jan 2001

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