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Modeling and simulation of semiconductor processes and devices are gaining importance in the semiconductor industry. Technology-computer aided design (TCAD) tools have the potential for rapid, inexpensive simulation experiments. But their effective use in the industry has been hampered by several limitations. This article highlights some of the problems and discusses possible approaches for the effective use of TCAD in the industry. © 2000 American Vacuum Society.
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:18
,
Issue:
1
)
Date of Publication: Jan 2000
- Page(s):
- 354 - 360
- ISSN :
- 1071-1023
- Digital Object Identifier :
- 10.1116/1.591197
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 18 June 2009
- Issue Date :
- Jan 2000
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