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Models and methods: Effective use of technology-computed aided design in the industry

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1 Author(s)
Mouli, Chandra V. ; Process R&D, Micron Technology, Inc., Boise, Idaho 83707-0006

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.591197 

Modeling and simulation of semiconductor processes and devices are gaining importance in the semiconductor industry. Technology-computer aided design (TCAD) tools have the potential for rapid, inexpensive simulation experiments. But their effective use in the industry has been hampered by several limitations. This article highlights some of the problems and discusses possible approaches for the effective use of TCAD in the industry. © 2000 American Vacuum Society.

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:18 ,  Issue: 1 )