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Variable axis lens of mixed electrostatic and magnetic fields and its application in electron-beam lithography systems

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2 Author(s)
Zhao, Yan ; Institute of Materials Research and Engineering, Singapore 119260, Singapore ; Khursheed, Anjam

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.591068 

Existing variable axis lens (VAL) concepts are based upon the power series expansion of the lens field, which theoretically limits them to situations where the focusing and in-lens deflection fields are of the same type, usually magnetic. In this article, a general VAL condition is derived from the paraxial trajectory equation that is applicable to any combined focusing and in-lens deflection system with mixed magnetic and electrostatic fields. Two basic configurations of mixed-field VALs are predicated. The feasibility of a magnetic VAL using in-lens electrostatic deflectors for e-beam lithography applications is analyzed. Deflection aberration simulations show that this mixed-field VAL is comparable to its pure-field counterpart. © 1999 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:17 ,  Issue: 6 )

Date of Publication:

Nov 1999

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