Cart (Loading....) | Create Account
Close category search window
 

Comparison of metrology methods for quantifying the line edge roughness of patterned features

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Nelson, C. ; International SEMATECH, Austin, Texas 78741 ; Palmateer, S.C. ; Forte, A.R. ; Lyszczarz, T.M.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.591117 

Comparisons are made of two atomic force microscopes in different modes of operation, and two scanning electron microscopes, one high and one lower resolution for quantifying the edge roughness of patterned features in resist and silicon. Definitions of the edge roughness magnitude and spatial frequency are given. For each metrology method, the parameters that limit the edge roughness measurement and how they compare to the parameters that limit the critical dimension measurement are addressed. An attempt to quantify the edge roughness spatial frequency is also discussed. For the two best metrology methods the repeatability of the measurements was determined, and measurements were made to understand the correlation between them. © 1999 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:17 ,  Issue: 6 )

Date of Publication:

Nov 1999

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.