By Topic

Surface treatment of pure and alloyed aluminum using a new plasma-based ion implanter apparatus

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Popovici, D. ; INRS-Énergie et Matériaux, Université du Québec, Varennes, Québec J3X 1S2, Canada ; Terreault, B. ; Bolduc, M. ; Paynter, R.W.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.590651 

The characterization of an upgraded and flexible plasma-based ion implanter has been initiated, in terms of dose rate, uniformity, and control of the implant profile. In this article, we report the preliminary results of a comparative study of different means of hardening aluminium and reducing its friction coefficient, with an emphasis on microcharacterization [Auger electron spectroscopy (AES) and Rutherford backscattering spectroscopy depth profiling, x-ray photoelectron spectroscopy (XPS), and scanning force microscopy (SFM)]. In particular we present an AES study of the N and O depth profiles produced in Al by our system; an XPS characterization of the stoichiometry and bond chemistry of ion nitrided Al; and a SFM study of the respective roles of roughness and atomic forces in friction on the N-implanted samples. © 1999 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:17 ,  Issue: 2 )