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Surface treatment of pure and alloyed aluminum using a new plasma-based ion implanter apparatus

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7 Author(s)
Popovici, D. ; INRS-Énergie et Matériaux, Université du Québec, Varennes, Québec J3X 1S2, Canada ; Terreault, B. ; Bolduc, M. ; Paynter, R.W.
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The characterization of an upgraded and flexible plasma-based ion implanter has been initiated, in terms of dose rate, uniformity, and control of the implant profile. In this article, we report the preliminary results of a comparative study of different means of hardening aluminium and reducing its friction coefficient, with an emphasis on microcharacterization [Auger electron spectroscopy (AES) and Rutherford backscattering spectroscopy depth profiling, x-ray photoelectron spectroscopy (XPS), and scanning force microscopy (SFM)]. In particular we present an AES study of the N and O depth profiles produced in Al by our system; an XPS characterization of the stoichiometry and bond chemistry of ion nitrided Al; and a SFM study of the respective roles of roughness and atomic forces in friction on the N-implanted samples. © 1999 American Vacuum Society.

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:17 ,  Issue: 2 )