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Using neutral atoms and standing light waves to form a calibration artifact for length metrology

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5 Author(s)
Thywissen, J.H. ; Department of Physics, Harvard University, Cambridge, Massachusetts 02138 ; Johnson, K.S. ; Dekker, N.H. ; Chu, A.P.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.590420 

Beams of neutral metastable atoms can be patterned by spatially dependent deexcitation in a standing wave of laser light. Metastable atoms which hit a substrate transfer their internal energy (10–20 eV) to the surface and activate the formation of a durable carbonaceous resist from a vapor precursor. The resist can be used as an etch mask to transfer patterns into the substrate material. In this work, we report a recent experimental demonstration of this “standing wave quenching” (SWQ) patterning technique. We also present an analysis of the accuracy to which atom lithography and SWQ can form a periodic reference array for length metrology. We find that, with some modification of the experimental setup and parameters, the absolute period across a 1 mm2 patterned area can be known to one part in 106. © 1998 American Vacuum Society.

Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:16 ,  Issue: 6 )

Date of Publication: Nov 1998

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