By Topic

Improving pattern placement using through-the-membrane signal monitoring

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Perkins, F.K. ; U.S. Naval Research Laboratory, Washington, DC 20375 ; Marrian, C.R.K. ; Peckerar, M.C.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.590499 

We describe here a means of improving pattern placement accuracy in the electron-beam lithographic manufacture of membrane masks. Our method is based on collection of the beam transmitted through the membrane with a detector fixed to the mask assembly. A fiducial grid overlaid onto the detector is used to provide a global reference for measurement of the beam position during lithographic patterning. We give results from recent experiments with components of such a system, and estimate 1σ accuracy in our method to be on the order of 1.5 nm. We discuss the effect of beam scattering on our technique, and possible improvements in our implementation.  

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:16 ,  Issue: 6 )