By Topic

Reflection high-energy electron diffraction during substrate rotation: A new dimension for in situ characterization

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
3 Author(s)
Braun, W. ; Center for Solid State Electronics Research and Department of Electrical Engineering, Arizona State University, Tempe, Arizona 85287-6206 ; Moller, H. ; Zhang, Y.H.

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.589976 

We present two methods to access reciprocal space with reflection high-energy electron diffraction (RHEED) during substrate rotation. The extraction of an arbitrary number of still frames from a continuously changing RHEED pattern is realized by triggering the substrate rotation and it allows analysis of quasistatic RHEED patterns that are updated every revolution. At the same time, the intensity along a line parallel to the shadow edge can be used to reconstruct a planar cut through the reciprocal lattice similar to a low-energy electron diffraction pattern. This RHEED pattern directly reveals the symmetry of the surface reconstruction and its changes during the deposition process. © 1998 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:16 ,  Issue: 3 )