Cart (Loading....) | Create Account
Close category search window
 

Influence of data analysis and other factors on the short-term stability of vertical scanning-probe microscope calibration measurements

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Edwards, Hal ; Components and Materials Research Center, Texas Instruments, Inc., Dallas, Texas 75265 ; Jørgensen, Jan Friis ; Dagata, John ; Strausser, Yale
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.589933 

We report a study of a fundamental limit to the accuracy of vertical measurements made using scanning-probe microscopes (SPM): the short-term stability of a vertical calibration using a waffle-pattern artifact. To test the instrumental component of this stability, we acquired three data series, at different humidity levels. We compare the variations in waffle-pattern depth in these three data series with the differences in depth estimates using several different analysis methods. The three methods tested are: a histogram method, the scanning-probe image processor, and the polynomial step-function fit. To clarify the importance of the analysis method, a discussion of the different leveling, averaging, and depth-estimation aspects of the various methods is presented. To understand the true repeatability limit of SPM calibration, it is necessary to treat imaging artifacts such as tilt, nonlinearities, and image bow carefully. We find that, when such care is taken, the dependence of the average waffle-cell depth on algorithm is around 0.1%. This is less than the standard deviation of the step-height estimates of around 0.5%, which may be attributed to short-term instrumental variations in vertical SPM calibration. This is a far better stability than the 5%–10% variations observed under long-term aging of the piezo scanner. However, the histogram algorithm, which does not correct image bow, gives an average waffle-cell depth estimate which is nearly 1% higher than the others, indicating that careful image analysis is necessary if the measurement accuracy is to be comparable to the short-term stability of the piezo scanner. © 1998 American Vacuum Society.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:16 ,  Issue: 2 )

Date of Publication:

Mar 1998

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.