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Generic scanned-probe microscope sensors by combined micromachining and electron-beam lithography

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6 Author(s)
Zhou, H. ; Department of Electronics and Electrical Engineering, Glasgow University, Glasgow G12 8QQ, United Kingdom ; Midha, A. ; Mills, G. ; Thoms, S.
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We present a novel method for the fabrication of generic scanned-probe microscope probes by performing multiple level direct-write electron-beam lithography on the apex of micromachined atomic force microscope tips. Pattern transfer is by conventional etching or liftoff in a wide range of materials. Lithographic resolution is 50 nm or better. The substrates support the use of automatic alignment and allow for the fabrication of 50 probes/in2. The integration of a force-sensing cantilever permits simple height regulation of the probes during operation. The technology is illustrated by the fabrication of thermocouple and near-field optical probes. © 1998 American Vacuum Society.

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:16 ,  Issue: 1 )