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We fabricated very thin ZnO:Zn film using rf magnetron sputtering and ZnS:Pr,Ce layer by electron-beam evaporation for color field emission display application. Also, in order to investigate the influence of surface conductive layer onto the phosphor films upon the emission characteristics, we prepared the layered structures having an additional conducting layer of 2–6-nm-thick Sn-doped
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:15
,
Issue:
2
)
Date of Publication: Mar 1997