Cart (Loading....) | Create Account
Close category search window

Tapping mode atomic force microscopy observation of self‐affine fractal roughness in electrochemically roughened silver electrode surfaces

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Otsuka, I. ; Department of Chemistry, Ohu University, Misumido 31‐1, Tomita‐cho, Koriyama 963, Japan ; Iwasaki, T.

Your organization might have access to this article on the publisher's site. To check, click on this link: 

We have investigated recrystallization of an electrochemically roughened silver electrode surface in Ar‐saturated water, using cyclic voltammetry (CV), Auger electron spectroscopy (AES), and tapping mode atomic force microscopy (TMAFM). Comparison of CVs before and after 92 h relaxation in water indicates that surface flattening occurs at room temperature when the roughened Ag is in contact with water. An AES spectrum of the Ag surface before the relaxation shows that chlorine still remains on the surface, probably in the form of AgCl. We determined the roughness exponents (α) for the roughened Ag surfaces before and after the relaxation from the slopes of the linear regions observed in plots of log (the interface width) vs log (length scale) calculated from TMAFM data. At larger length scales than the average Ag nodule size, αs were 0.50±0.02 and 0.64±0.02 for the roughened surfaces before and after the relaxation, respectively. These results suggest that the scaling theory may be applicable to the recrystallization process at the submicron level. © 1996 American Vacuum Society

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:14 ,  Issue: 2 )

Date of Publication:

Mar 1996

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.