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Effects of rapid thermal annealing on InP layers grown on GaAs substrates by gas‐source molecular beam epitaxy

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4 Author(s)
Riesz, F. ; Tampere University of Technology, Department of Physics, P. O. Box 527, SF‐33101 Tampere, Finland ; Rakennus, Keijo ; Hakkarainen, Tuula ; Pessa, M.

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InP layers were grown on (100) GaAs substrates by gas‐source molecular beam epitaxy and then were annealed by the rapid thermal annealing (RTA) method. The effects of annealing time and temperature on crystalline structure were studied by double‐crystal x‐ray diffraction. Significant improvement in crystalline quality was observed, due to RTA. The smallest linewidth was 315 s of arc for the 2‐μm‐thick layers upon annealing at 940 °C for 10 s. Using lower temperatures and longer annealing times, the linewidths remained broader but the loss of phosphorus was reduced.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:9 ,  Issue: 1 )

Date of Publication:

Jan 1991

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