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Rapid thermal processing systems: A review with emphasis on temperature control

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2 Author(s)
Roozeboom, Fred ; Philips Research Laboratories, P.O. Box 80,000, NL‐5600 JA Eindhoven, The Netherlands ; Parekh, N.

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This paper highlights the basic principles of rapid thermal processing (RTP) systems and the important areas of concern. The basic system characteristics, the fundamental physics involved, and the techniques for temperature measurement and control are extensively reviewed. We summarize the options currently available for 15 RTP equipment manufacturers and point out the latest developments in RTP system design and temperature measurement. Some novel options for temperature control (optical, fiber optical, and photoacoustic) are included.

Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:8 ,  Issue: 6 )

Date of Publication: Nov 1990

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