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Surface photoprocesses in laser‐assisted etching and film growth

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1 Author(s)
Houle, F.A. ; IBM Research Division, Almaden Research Center, San Jose, California 95120

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.584565 

Photochemical etching and deposition systems involve a range of laser‐induced and spontaneous processes occurring on rough, chemically heterogeneous surfaces. As such, they present an interesting opportunity for extending our understanding of surface photophysical and photochemical phenomena. In this article results of recent experiments investigating the effect of illumination on adsorption, dissociation, and desorption in such systems are described. Studies carried out under realistic film deposition and etching conditions are compared to studies of submonolayer assemblies on clean crystalline surfaces.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:7 ,  Issue: 5 )