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Optimization of system parameters for throughput in a variable rectangular electron beam exposure system

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1 Author(s)
Takamoto, Kiichi ; NTT Electrical Communications Laboratories, 3‐1, Morinosato Wakamiya, Atsugi‐shi, Kanagawa, 243‐01 Japan

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Optimization of system parameters for throughput is investigated under the condition that performances of an electron optical system and an X–Y table system, and large‐scale integrated (LSI) pattern properties are given. The beam is deflected by a vector scanning method. The table is operated in a step and repeat mode. Exposure time is calculated from resist exposure time, settling time of beam deflection digital–analog converters, and table movement time. It is shown that there exist field sizes, aperture angles, and maximum beam sizes which minimize the exposure time. Optimum system parameters depend on LSI pattern properties. The concept of optimizing system parameters for throughput can be applied to system parameter determination in the development of a high throughput exposure system.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:5 ,  Issue: 3 )

Date of Publication:

May 1987

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